FIZIKA A 4 (1995) 2, 445-448

VACUUM DEPOSITION SYSTEM FOR ION-BEAM-ASSISTED COATING TECHNOLOGIES

PAVEL HEDBÁVNÝ, PETR ŠTOVÍČEK, LOTHAR SIEGERT^* and PETER MÜLLER^*
VAKUUM PRAHA spol.s.r.o., V Holešovičkách 2 CZ-180 00 Praha 8, Czech Republic
^*MAT GmbH DRESDEN, Reisstrasse 3 D-01257 Dresden, Germany

Received 20 July 1995

Ion-beam-assisted deposition (IBAD) is increasingly used in thin film technologies to solve problems of adhesion, stress inside layers or to generate special properties of surfaces of solids. A small size IBAD system for use in research laboratories or for industrial use is described. The vacuum system uses a wide range turbomolecular pump and a diaphragm backing pump. The oil free system has a general advantage for thin film technologies. One or more planar magnetrons and a filamentless ion source are arranged in a cylindrical vacuum chamber. The system can be extended by additional chambers for loading, plasma cleaning and unloading. A computer control allows automatic coating procedures or manually controlled actions.

UDC 533.56
PACS 07.30.Cy

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